Micro-Fluidics Interest Group

In the column on the right you will find useful information about the manufacturing of micro-fluidic devices.

Below you will find recent posts on the 4M Association which are considered to be of interest to the Micro-fluidics Interest Group.

Plasma activation

Plasma activation is done with the intent to alter or improve adhesion properties of surfaces prior to coating, etc. Weakly ionised oxygen plasma is used and several processes take place. Plasma removes surface layers with the lowest molecular weight, at the same time it oxidises the uppermost atomic layer of the polymer. Oxygen radicals (and UV radiation, if present) help break up bonds and promote the three dimensional cross bonding of molecules.

Screen printing

Screen printing is a method to deposit a metal layer of defined shape on a surface. The shape of the layer can be designed as desired. A paste containing metal particles is the printed on the surface as in classical screen printing. Further thermal processes are applied for removing binders and for sintering the metal particles.

Electroplating

Electroplating is a plating process that uses electrical current to reduce cations of a desired material from a solution and coat a conductive object with a thin layer of the material, such as a metal. The anode and cathode in the electroplating cell are both connected to an external supply of direct current - a battery or, more commonly, a rectifier. The anode is connected to the positive terminal of the supply, and the cathode (article to be plated) is connected to the negative terminal. When the external power supply is switched on, the metal at the anode is oxidized from the zero valence state to form cations with a positive charge. These cations associate with the anions in the solution. The cations are reduced at the cathode to deposit in the metallic, zero valence state.

Thermal evaporation

One approach to creating a thin-film coating is to create a cloud of vapor of the desired material and then present the substrate to this cloud. This can be done by heating a crucible containing the coating material. The material must be above its melting point before any useful amount of matter enters the vapor phase. Generally, such heated material sticks to and coats any cold surface. It is important to have vacuum conditions when depositing in this manner, because the atoms in the vapor should hit the wafer before being cooled by any atmosphere in the chamber. If the pressure is too high, then there are too any foreign atoms in the deposition chamber. Such conditions would have a negative influence on the purity of the deposited thin films.

4th congress on Micro and Nano Manufacturing

Micromachines - Supporting the 4M Association

MDPI - Supporting the 4M Association

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Micro-Fluidics Interest Group

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