RAL

used material: Metals (Cr, Al)

material properties:
most relevant chemical non-resistance: strong acids
optical transparency: opaque

process parameters:
temperature: ~100 C (photo resist baking)
used chemicals: photoresist developer
e-beam direct writing might be required

Contact:

RAL

Rutherford Appleton Laboratory
CMF
Dr. Andreas Schneider
Building R18 room G55
Chilton, Didcot
Oxfordshire
OX11 0QX
United Kingdom

phone: +44-(0)1235-44-5178
A.Schneider@rl.ac.uk

4th congress on Micro and Nano Manufacturing

Micromachines - Supporting the 4M Association

MDPI - Supporting the 4M Association

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