RAL

used material: Metals (Cr, Al)

material properties:
most relevant chemical non-resistance: strong acids
optical transparency: opaque

process parameters:
temperature: ~100 C (photo resist baking)
used chemicals: photoresist developer
e-beam direct writing might be required

Contact:

RAL

Rutherford Appleton Laboratory
CMF
Dr. Andreas Schneider
Building R18 room G55
Chilton, Didcot
Oxfordshire
OX11 0QX
United Kingdom

phone: +44-(0)1235-44-5178
A.Schneider@rl.ac.uk

4th congress on Micro and Nano Manufacturing

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Micro-Fluidics Interest Group RAL used material: Metals (Cr, Al) material properties: most relevant chemical non-resistance: strong acids optical transparency: opaque process parameters: temperature: ~100 C (photo resist baking) used chemicals: photoresist developer e-beam direct writing might be required Contact: RAL Rutherford Appleton Laboratory CMF Dr. Andreas Schneider Building R18 room G55 Chilton, Didcot Oxfordshire OX11 0QX United Kingdom phone: +44-(0)1235-44-5178 A.Schneider@rl.ac.uk ‹ FEMTO-ST up Micro contact printing › Printer-friendly version	4th congress on Micro and Nano Manufacturing Manufacturing Micro-Fluidics Structuring Deposition techniques Bonding Creating holes Metallization Surface modification Micro dispensing Lift-off FEMTO-ST RAL Micro contact printing Soft lithography Micromachines - Supporting the 4M Association MDPI - Supporting the 4M Association
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