RAL

process parameters:
used chemicals: Oxygen plasma
flow rate of gas: up to 200 sccm
RF plasma: up to 300 W

Contact:

RAL

Rutherford Appleton Laboratory
CMF
Dr. Andreas Schneider
Building R18 room G55
Chilton, Didcot
Oxfordshire
OX11 0QX
United Kingdom

phone: +44-(0)1235-44-5178
A.Schneider@rl.ac.uk

4th congress on Micro and Nano Manufacturing

Micromachines - Supporting the 4M Association

MDPI - Supporting the 4M Association

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