Process Details

used material: Silica (SiO2)

material properties:
thermal stability up to 1723 °C
most relevant chemical non-resistance: HF

process parameters:
temperature: 900 to 1050 °C
used chemicals: O2, N2 (inert gas)
layer thickness several 100th nm



Rutherford Appleton Laboratory
Dr. Andreas Schneider
Building R18 room G55
Chilton, Didcot
OX11 0QX
United Kingdom

phone: +44-(0)1235-44-5178

4th congress on Micro and Nano Manufacturing

Micromachines - Supporting the 4M Association

MDPI - Supporting the 4M Association

User login

Micro-Fluidics Interest Group

  • You must login in order to post into this group.