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Micro-Fluidics Interest Group Process Details used material: Doped Silicon dimensions: min. structure wide: 100µm wire from 50 to 250 µm Contact: FEMTO-ST CNRS-FEMTO-ST Dpt. LPMO Dr. Chantal Khan Malek 32 Av. de l' Observatoire 25044 Besancon France phone: +33 (0)3 81 85 39 35 chantal.khan-malek@femto-st.fr ‹ wire electro-discharge machining up Deposition techniques › Printer-friendly version	4th congress on Micro and Nano Manufacturing Manufacturing Micro-Fluidics Structuring casting electro-discharge machining hot embossing injection moulding ion etching laser photo ablation lithography micro-milling micro-sandblasting micro-thermoforming plasma etching stereolithography water jet (WJ) and sinking electrical discharge machining wet chemical etching wire electro-discharge machining Process Details Deposition techniques Bonding Creating holes Metallization Surface modification Micro dispensing Micromachines - Supporting the 4M Association MDPI - Supporting the 4M Association
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4th congress on Micro and Nano Manufacturing